The correct statement regarding polymeric silicon dioxide is :

 
1. Each silicon atom is surrounded by four oxygen atoms and each oxygen atom is bonded to two silicon atoms.
2. Each silicon atom is surrounded by two oxygen atoms and each oxygen atom is bonded to two silicon atoms.
3. Silicon atom is bonded to two oxygen atoms.
4. These are double bonds between silicon and oxygen atoms.

Subtopic:  Properties of Structure of SiO2 & Other Compounds |
 79%
Level 2: 60%+
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AlF3 is soluble in HF only in the presence of KF due to the formation of:

1. K3[AlF3H3] 2. K3[AlF6]
3. AlH3 4. K[AlF3H]
Subtopic:  Boron Family- Preparations, Properties & Uses |
 80%
Level 1: 80%+
NEET - 2016
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The correct statement among the following is :

1. Sn2+ is an oxidizing agent while Pb4+ is a reducing agent.
2. Sn2+ and Pb2+ both are oxidizing agents.
3. Sn4+ is a reducing agent while Pb4+ is an oxidizing agent.
4. Sn2+ is a reducing agent while Pb4+ is an oxidizing agent.

Subtopic:  Carbon Family - Preparations, Properties & Uses |
 69%
Level 2: 60%+
NEET - 2017
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An element that cannot form MF63- ion is-

1. Ga 2. Al
3. B 4. In
Subtopic:  Compounds of Boron- Preparations, Properties & Uses |
 82%
Level 1: 80%+
NEET - 2018
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The correct order of atomic radii of the group 13 elements is-

1. B < Al < In < Ga < Tl
2. B < Al < Ga < In < Tl
3. B < Ga < Al < Tl < In
4. B < Ga < Al < In < Tl

Subtopic:  Boron Family- Preparations, Properties & Uses |
 70%
Level 2: 60%+
NEET - 2018
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Which of the following compounds has a structure similar to graphite?

1. B
2. B4C
3. B2H6
4. BN

Subtopic:  Carbon Family - Preparations, Properties & Uses |
 60%
Level 2: 60%+
AIPMT - 2013
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A compound among the following that is least likely to behave as a Lewis base is:

1. NH3 2. BF3
3. OH- 4. H2O
Subtopic:  Anomalous Behaviour of B & C |
 79%
Level 2: 60%+
AIPMT - 2011
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Silicate, among the following, has only one oxygen atom of \([SiO_4]^{4-}\) shared with the next unit:
1. Sheet silicate 2. Pyrosilicate
3. Three dimensional silicate 4. Linear chain silicate
Subtopic:  Properties of Structure of SiO2 & Other Compounds |
 56%
Level 3: 35%-60%
AIPMT - 2011
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The stability of the +1 oxidation state increases in the sequence:

1. Al <Ga<In<Tl

2. Tl<In<Ga<Al

3. In<Tl<Ga<Al

4. Ga<In<Al<Tl

Subtopic:  Boron Family- Preparations, Properties & Uses |
 91%
Level 1: 80%+
AIPMT - 2009
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Al2O3 can be converted to anhydrous AlCl3 by heating:

1. Al2O3 with HCl gas

2. Al2O3 with NaCl in solid-state

3. a mixture of Al2O3  and carbon in dry Cl2 gas

4. Al2O3  with Cl2 gas

Subtopic:  Boron Family- Preparations, Properties & Uses |
Level 3: 35%-60%
AIPMT - 2006
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