Which of the correct sequence in the following properties? For the correct order mark (T) and for the incorrect order mark (F) :
(a) Lewis acidity order :
(b) Melting point :
(c) Boiling point :
(d) Dipole moment order :
(a) FTFT (b) TFTF (c) FFTT (d) FFTF
(a) (F); As the size of halogen atom increases crowding on Si atom will
increase, hence, tendency of attack of Lewis base decreases.
(b) (T); M.P. of is higgest due to intermolecular H-bonding in it.
Next lower M.P. will be of followed by due to high mol.wt.
(c) (F); M.P. and M.P. of increase from to via due to
increase in mol. wt. does not follow this trend due to inter
(d) (T); Value of bond moment decreases.