The stability of the +1 oxidation state increases in the sequence:

1. Al <Ga<In<Tl

2. Tl<In<Ga<Al

3. In<Tl<Ga<Al

4. Ga<In<Al<Tl

Subtopic:  Boron Family- Preparations, Properties & Uses |
 92%
Level 1: 80%+
AIPMT - 2009
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The incorrect statement among the following is:

1.  SnF4 is ionic in nature.

2.  PbF4 is covalent in nature.

3.  SiCl4 is easily hydrolysed.

4.  GeX4 (X = F, Cl, Br, I) is more stable than GeX2

Subtopic:  Carbon Family - Preparations, Properties & Uses |
 63%
Level 2: 60%+
NEET - 2019
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AlCl3 on hydrolysis gives -

1. Al2O3.H2O

2. AlOH3

3. Al2O3

4. AlCl3.6H2O

Subtopic:  Boron Family- Preparations, Properties & Uses |
 61%
Level 2: 60%+
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Silicate, among the following, has only one oxygen atom of \([SiO_4]^{4-}\) shared with the next unit:
1. Sheet silicate 2. Pyrosilicate
3. Three dimensional silicate 4. Linear chain silicate
Subtopic:  Carbon Family - Preparations, Properties & Uses |
 58%
Level 3: 35%-60%
AIPMT - 2011
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A compound among the following that is least likely to behave as a Lewis base is:

1. NH3 2. BF3
3. OH- 4. H2O
Subtopic:  Anomalous Behaviour of B & C |
 79%
Level 2: 60%+
AIPMT - 2011
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A compound among the following having a similar structure to graphite is:

1. B
2. B4C
3. B2H6
4. BN

Subtopic:  Carbon Family - Preparations, Properties & Uses |
 62%
Level 2: 60%+
AIPMT - 2013
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The correct order of atomic radii of the group 13 elements is-

1. B < Al < In < Ga < Tl
2. B < Al < Ga < In < Tl
3. B < Ga < Al < Tl < In
4. B < Ga < Al < In < Tl

Subtopic:  Boron Family- Preparations, Properties & Uses |
 70%
Level 2: 60%+
NEET - 2018
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An element that cannot form MF63- ion is-

1. Ga 2. Al
3. B 4. In
Subtopic:  Compounds of Boron- Preparations, Properties & Uses |
 82%
Level 1: 80%+
NEET - 2018
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The correct statement among the following is :

1. Sn2+ is an oxidizing agent while Pb4+ is a reducing agent.
2. Sn2+ and Pb2+ both are oxidizing agents.
3. Sn4+ is a reducing agent while Pb4+ is an oxidizing agent.
4. Sn2+ is a reducing agent while Pb4+ is an oxidizing agent.

Subtopic:  Carbon Family - Preparations, Properties & Uses |
 69%
Level 2: 60%+
NEET - 2017
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The correct statement regarding polymeric silicon dioxide is -

 
1. Each silicon atom is surrounded by four oxygen atoms and each oxygen atom is bonded to two silicon atoms.
2. Each silicon atom is surrounded by two oxygen atoms and each oxygen atom is bonded to two silicon atoms.
3. Silicon atom is bonded to two oxygen atoms.
4. These are double bonds between silicon and oxygen atoms.
Subtopic:  Properties of Structure of SiO2 & Other Compounds |
 79%
Level 2: 60%+
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